Analysis of 20nm SOI MOSFET SRAM Design Using Different Gate Materials
نویسنده
چکیده
The SOI MOSFET technique is used to overcome the scaling effects. In this work, 20nm SOI MOSFET using Poly silicon as gate material of both Ntype and P-type were designed. The same SOI MOSFET is designed using Molybdenum as gate material for both N-type and P-type and the device characteristics werecompared and analysed.
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